May 23, 2009

Benjamin Lee, b c1765, d c1818

A descendant of Benjamin Lee is of haplogroup I1 and is grouped under Randaulph Lee in the Lee DNA Genealogy Project at ancestry.com The descendant has a genetic distance of 2 from a descendant of Samuel Leigh who is believed to have the same Y-DNA marker values as Ralph Leigh. There were 42 markers compared between the two men. The descendant of Samuel Leigh was tested by Ancestry as well as by FamilyTree.

The genetic distance of 2 is a close relationship and indicates there is likely a common ancestor for the two donors within a genealogical time frame from the donors. However, Benjamin Lee lived in the United States while Ralph Leigh was likely born in England and lived most of his life in Wales. Information about the ancestor of Benjamin Lee who immigrated to the United States is unknown at this time.

The Possible Immigrants page of the Welsh Leigh site that documents Ralph Leigh lists 21 places in the Leigh Descendancy Chart where side lines could have furnished immigrants to the United States. In addition, the sidelines could have been created prior to the birth of Ralph Leigh.

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